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Process Requirements for Continued Scaling of CMOS - The Need and Prospects for Atomic-Level Manipulation

• Tags:
• circuit,
• function,
• progress,
• materials

Overview Since the advent of the Si-based integrated circuit, ever-increasing function has been available at reduced cost and with reduced consumption of power. This "Semiconductor revolution" has been possible because semiconductor devices have the unique feature that as they become smaller they also become faster, consume less power, become cheaper per circuit, and enable more function per unit area of Si. Among the processes being developed for future needs are a range of self-limited growth and etching reactions as well as other process steps that take advantage of atomic-level control and manipulation to enable new classes of substrate materials. The requirements that drive such a level of control, as well as the progress and prospects for these new techniques, are discussed in this paper.

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