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Semiconductor Tech. - Manufacturing White Papers

Application of Electron-Beam Direct-Writing Technology to System-LSI Manufacturing

Overview EB (electron-beam) direct-writing lithography has not only been used for semiconductor research and development but has also been applied to small-volume fabrication of custom LSI (large-scale integration) chips. This paper first describes the EB direct writing lithography system that has been developed and put on the market by Hitachi High-Technologies Corporation. It then describes an example application of the system to fabrication of silicon devices. Lastly, it outlines the current status and future developments concerning direct writing with the developed EB lithography system.

Further White Paper Details
Publisher	Hitachi	File Format	PDF, requires Acrobat Rdr 5
Date Published	October 2003	Downloads	203
Format	White Papers
Topics	Semiconductor Tech. - Manufacturing, ASICs - Chip Sets

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Application of Electron-Beam Direct-Writing Technology to System-LSI Manufacturing

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